Optical constants and growth mode of Ni films deposited on evaporated Al, Ag and Cu films

被引:6
作者
Hanamoto, K
Shinya, A
Kuwahara, M
Okamoto, T
Haraguchi, M
Fukui, M [1 ]
Koto, K
机构
[1] Univ Tokushima, Fac Engn, Dept Opt Sci & Technol, Tokushima 770, Japan
[2] Univ Tokushima, Fac Integrated Arts & Sci, Dept Math & Nat Sci, Tokushima 770, Japan
关键词
electron microscope; magnetic metallic films; magnetic metallic surfaces; nickel; optical constant; reflection spectroscopy; X-ray diffraction;
D O I
10.1016/S0039-6028(98)00184-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Information about the optical constants and structures of Ni films in Ni/Al(AlOx. Al), Ni/Ag and Ni/Cu(CuOx. Cu) bilayer systems are obtained through an attenuated total reflection (ATR) analysis, scanning electron spectroscopy (SEM) observation and the X-ray diffraction measurements. In particular, the optical constants of the Ni films are evaluated at various stages of growth. It is finally concluded that the Ni films show island growth for the Ni/Al(AlOx. Al) and Ni/CuOx. Cu bilayers, whereas layer-by-layer growth is found for the Ni films in the Ni/Cu system. It is confirmed from SEM images that the Ni him on the Ag him shows island growth, but the ATR experimental results indicate that it becomes continuous at a very early stage of growth. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:413 / 420
页数:8
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