Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

被引：281

作者：

Heister, K

Zharnikov, M

Grunze, M

Johansson, LSO

Ulman, A

机构：

[1] Univ Heidelberg, D-62120 Heidelberg, Germany

[2] Karlstad Univ, Dept Phys, S-65188 Karlstad, Sweden

[3] Polytech Univ, Dept Chem, Brooklyn, NY 11201 USA

[4] NSF MRSEC Polymers Engn Interfaces, Brooklyn, NY 11201 USA

来源：

LANGMUIR | 2001年 / 17卷 / 01期

关键词：

D O I：

10.1021/la001101d

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Synchrotron-based high-resolution X-ray. photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.

引用

页码：8 / 11

页数：4

共 24 条

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