Photochemical deposition of CdS from aqueous solutions

被引:28
作者
Ichimura, M [1 ]
Goto, F
Arai, E
机构
[1] Nagoya Inst Technol, Ctr Cooperat Res, Nagoya, Aichi 4668555, Japan
[2] Nagoya Inst Technol, Dept Elect & Comp Engn, Nagoya, Aichi 4668555, Japan
关键词
D O I
10.1149/1.1391716
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
CdS was deposited on a glass substrate by photochemical deposition (PCD). The substrate was held in an aqueous solution containing S2O32- and Cd2+ and was irradiated with a mercury lamp. Then a CdS film was deposited in the irradiated region of the substrate. The deposition rate depended on various experimental parameters, such as pH of the solution, light intensity, and stirring speed, which were investigated. Here we discuss the deposition mechanism. It was shown that the deposition rate is determined by (i) density of nucleation sites on the substrate, (ii) light intensity, and (iii) transport of the ions in the solution. In the stirred solution, the former two factors are dominant. It was also demonstrated that a pattern can be made on the film using a mask. This proves that PCD has good controllability and thus is well suited for fabrication of devices such as solar cells. (C) 1999 The Electrochemical Society. S0013-4651(98)06-025-X. All rights reserved.
引用
收藏
页码:1028 / 1034
页数:7
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