Lattice location and electrical conductivity in ion implanted TiO2 single crystals

Single crystals of TiO2 (rutile) were implanted at room temperature with Ar, Sn and W ions applying fluences of 10(15)/cm(2) to 10(16)/cm(2) at 300 keV. The lattice location, together with ion range and damage distribution was measured with Rutherford Backscattering and Channeling (RBS-C). The conductivity sigma, was measured as a function of temperature. The implanted Sn and W atoms were entirely substitutional on Ti sites in the applied fluence region, where the radiation damage did not yet reach the random level. A large sigma increase was observed for all implants at displacement per atom values (dpa) below 1. Above dpa = 1, sigma reveals a saturation value of 0.3 Omega(-1) cm(-1) for Ar implants, while for W and Sn implants a further increase of sigma up to 30 Omega(-1) cm(-1) was measured. Between 70 K and 293 K In sigma was proportional to T--1/2, (Ar,W) and T--1/4 (Sn), indicating that the transport mechanism is due to variable range hopping.