Optical emission and microwave field intensity measurements in surface wave-excited planar plasma

被引:84
作者
Nagatsu, M [1 ]
Xu, G [1 ]
Yamage, M [1 ]
Kanoh, M [1 ]
Sugai, H [1 ]
机构
[1] TOSHIBA CO LTD,MFG RES CTR,YOKOHAMA,KANAGAWA 235,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1996年 / 35卷 / 3A期
关键词
microwave plasma; surface wave; slot antenna; large-diameter plasma; high-density plasma; optical emission; microwave field intensity; mode structure; cutoff density;
D O I
10.1143/JJAP.35.L341
中图分类号
O59 [应用物理学];
学科分类号
摘要
A large-planar (22 cm diam.) high-density (similar to 2 x 10(12) cm(-3)) plasma is produced in argon gas at 140 Pa by 2.45 GHz-1 kW discharges, using a microwave launcher of small slot antennas. The two-dimensional distributions of optical emission intensities as well as microwave field intensities are measured near the plasma surface irradiated with microwaves. Both the optical emission and the microwave field clearly show stationary patterns of azimuthal mode m = 3 and radial mode n = 3 at higher pressures (140 Pa), while a mode change to m = 6 and n = 2 is observed at lower pressures (44 Pa). These patterns are attributed to the excitation and absorption of standing surface waves near the cutoff layer.
引用
收藏
页码:L341 / L344
页数:4
相关论文
共 17 条
[1]   OXIDE ETCHING USING SURFACE-WAVE COUPLED PLASMA [J].
AKIMOTO, T ;
IKAWA, E ;
SANGO, T ;
KOMACHI, K ;
KATAYAMA, K ;
EBATA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12B) :7037-7041
[2]   SPATIAL INVESTIGATION OF A LARGE-DIAMETER MICROWAVE PLASMA [J].
BLUEM, E ;
BECHU, S ;
BOISSELAPORTE, C ;
LEPRINCE, P ;
MAREC, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (07) :1529-1533
[3]   RESIST STRIPPING IN AN O2 + H2O PLASMA DOWNSTREAM [J].
FUJIMURA, S ;
SHINAGAWA, K ;
SUZUKI, MT ;
NAKAMURA, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :357-361
[4]  
KOMACHI K, 1990, J MICROWAVE POWER EE, V25, P236
[5]  
KOMACHI K, 1989, J MICROWAVE POWER EE, V24, P140
[6]   TUBE DIAMETER AND WAVE FREQUENCY LIMITATIONS WHEN USING THE ELECTROMAGNETIC SURFACE-WAVE IN THE M = 1 (DIPOLAR) MODE TO SUSTAIN A PLASMA-COLUMN [J].
MARGOTCHAKER, J ;
MOISAN, M ;
CHAKER, M ;
GLAUDE, VMM ;
LAUQUE, P ;
PARASZCZAK, J ;
SAUVE, G .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) :4134-4148
[7]   PLASMA SOURCES BASED ON THE PROPAGATION OF ELECTROMAGNETIC SURFACE-WAVES [J].
MOISAN, M ;
ZAKRZEWSKI, Z .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1991, 24 (07) :1025-1048
[8]   SMALL MICROWAVE PLASMA SOURCE FOR LONG COLUMN PRODUCTION WITHOUT MAGNETIC-FIELD [J].
MOISAN, M ;
BEAUDRY, C ;
LEPRINCE, P .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1975, PS 3 (02) :55-59
[9]  
MOISAN M, 1992, MICROWAVE EXCITED PL, P123
[10]  
SAUVE G, 1993, J MICROWAVE POWER EE, V28, P123