Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

被引：41

作者：

Glöss, D ^{[1
]}

Frach, P ^{[1
]}

Zywitzki, O ^{[1
]}

Modes, T ^{[1
]}

Klinkenberg, S ^{[1
]}

Gottfried, C ^{[1
]}

机构：

[1] FEP, D-01277 Dresden, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 1-4期

关键词：

titanium dioxide; photocatalysis; pulse magnetron sputtering; reactive sputtering; low temperature deposition;

D O I：

10.1016/j.surfcoat.2005.01.018

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An innovative reactive pulse magnetron sputtering (PMS) system allowing to change the pulse mode (unipolar, bipolar or pulse packet) has been used to deposit TiO2 films at dynamic deposition rates of 8...50 nm m/min. Photo-induced hydrophilicity, and photocatalytic degradation by UV-A illumination were investigated by measuring the decrease of the water contact angle and the decomposition of methylene blue organic dye, respectively. It was observed that using the PMS technology the TiO2 layers can be deposited in situ crystalline at temperatures much lower than the necessary annealing temperature for amorphous deposited layers. Moreover, these in situ crystalline deposited layers have superior photocatalytic properties to that of amorphous deposited post-annealed TiO2 layers. Thin TiO2 films (< 50 nm) deposited at substrate temperatures as low as 130 degrees C exhibit sufficient photocatalytic activity for many applications. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：967 / 971

页数：5

共 8 条

[1] High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications [J].