Mechanical properties of sputter-deposited titanium-silicon-carbon films

被引:30
作者
Krzanowski, JE [1 ]
Koutzaki, SH [1 ]
机构
[1] Univ New Hampshire, Dept Mech Engn, Durham, NH 03824 USA
关键词
D O I
10.1111/j.1151-2916.2001.tb00724.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of SiC additions on the mechanical properties of TiC films was investigated. Ti-Si-C films with varying SiC content were deposited using dual-cathode radio-frequency magnetron sputtering. The nanoindentation hardness of these films increased with SIC content to a maximum of 20-22 GPa for films in the range of 15-30 at,% SiC. The elastic modulus was also measured, and the hardness to modulus ratio (H/E) increased with SiC content, indicating that hardness increases were due to microstructural effects. The residual stress,vas measured in several films, but was low in magnitude, indicating that hardness measurements were not influenced by residual stress. TEM examination of several films revealed that the SiC additions altered the film microstructure in a manner that could account for the observed hardness increases.
引用
收藏
页码:672 / 674
页数:3
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