Ion-beam irradiation of Cu and a Cu-Ni alloy single-crystal specimens: Proposed atom movement mechanism

被引:9
作者
Fujino, Y [1 ]
Igarashi, Y
Nagata, S
机构
[1] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
[2] Tohoku Univ, Dept Machine Intelligence & Syst Engn, Sendai, Miyagi 9808579, Japan
[3] Tohoku Univ, Mat Res Dept, Sendai, Miyagi 9808577, Japan
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 10期
关键词
D O I
10.1103/PhysRevB.63.100101
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Rutherford backscattering and channeling measurements have been applied to study deep radiation damage and depth profile of implanted Au atoms in pure Cu and Cu-1 at. % Ni alloy single-crystal specimens, which were irradiated off axis at room temperature by 300 keV Au+ ions to a dose of 2 x 10(16) ions/cm(2). The damage range and depth range of the implanted Au atoms in the specimens of pure Cu were strikingly deeper than those in the specimens of Cu-1 at. % Ni alloys, respectively. An atom movement mechanism in solids under ion beam irradiation is proposed as the origin of the observed result.
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页数:4
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