Low-temperature growth of SnOx thin films using reactive ion-assisted deposition

被引：3

作者：

Cho, JS ^{[1
]}

Song, SK ^{[1
]}

Jung, HJ ^{[1
]}

Koh, SK ^{[1
]}

Choi, WK ^{[1
]}

Yoon, KH ^{[1
]}

机构：

[1] YONSEI UNIV, DEPT CERAM ENGN, SUDAEMOON GU, SEOUL 120749, SOUTH KOREA

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1997年 / 16卷 / 07期

关键词：

D O I：

10.1023/A:1018545217200

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：524 / 527

页数：4

共 19 条

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[5]

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[8]

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[9] VARIANT STRUCTURE IN METAL-ORGANIC-CHEMICAL-VAPOR-DEPOSITION-DERIVED SNO2 THIN-FILMS ON SAPPHIRE (0001) [J].

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[10] PROPERTIES OF INDIUM TIN OXIDE-FILMS PREPARED BY ION-ASSISTED DEPOSITION [J].

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