Study of improvement technology of photocatalytic activity on the TiO2 sol by plasma treatment after dip-coating processing

被引：10

作者：

Jung, CK ^{[1
]}

Cho, SH

Lee, SB

Kim, TK

Lee, MN

Boo, JH

机构：

[1] Sungkyunkwan Univ, Dept Chem, Suwon 440746, South Korea

[2] Sungkyunkwan Univ, Inst Basic Sci, Suwon 440746, South Korea

[3] Solartech, Guemchon Gu, Seoul, South Korea

来源：

SURFACE REVIEW AND LETTERS | 2003年 / 10卷 / 04期

关键词：

TiO2; films; dip-coating; TiO2 precursor sol; plasma treatment; photocatalytic activity;

D O I：

10.1142/S0218625X03005499

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have deposited titanium dioxide (TiO2) thin films on glass using a single molecular precursor such as titanium (IV) isopropoxide (Ti[OCH(CH3)(2)](4), 97%) by sol-gel processing. Argon and oxygen rf plasma treatments at 295 K for 0.5 h in the power range of 50-200 W were also used to elevate photocatalytic activity of the as-grown TiO2 films. A superhydrophilic property and surface morphology change appeared in the light irradiation with O-2 plasma treatment. In this work, the effect of the plasma with photocatalyst (TiO2) on the improvement of hydrophilic properties has mainly been investigated. Photocatalytic activity was evaluated by measurements of the uv/vis. irradiation, refractive index, contact angle, and AFM analysis. We confirmed that plasma treatment is a very reliable method for the synthesis of TiO2 thin films with high catalytic performance.

引用

页码：635 / 640

页数：6

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