Experimental analysis and theoretical model for anomalously high ideality factors (n>>2.0) in AlGaN/GaN p-n junction diodes

被引:425
作者
Shah, JM [1 ]
Li, YL [1 ]
Gessmann, T [1 ]
Schubert, EF [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
关键词
D O I
10.1063/1.1593218
中图分类号
O59 [应用物理学];
学科分类号
摘要
Diode ideality factors much higher than the expected values of 1.0 to 2.0 have been reported in GaN-based p-n junctions. It is shown that moderately doped unipolar heterojunctions as well as metal-semiconductor junctions, in particular the metal contact to p-type GaN, can increase the ideality factor to values greater than 2.0. A relation is derived for the effective ideality factor by taking into account all junctions of the diode structure. Diodes fabricated from a bulk GaN p-n junction and a p-n junction structure with a p-type AlGaN/GaN superlattice display ideality factors of 6.9 and 4.0, respectively. These results are consistent with the theoretical model and the fact that p-type AlGaN/GaN superlattices facilitate the formation of low-resistance ohmic contacts. (C) 2003 American Institute of Physics.
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页码:2627 / 2630
页数:4
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