Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications

被引:73
作者
Feng, Yan [1 ]
Feser, Michael [1 ]
Lyon, Alan [1 ]
Rishton, Steve [1 ,2 ]
Zeng, Xianghui [1 ]
Chen, Sharon [1 ]
Sassolini, Simone [1 ]
Yun, Wenbing [1 ]
机构
[1] Xradia Inc, Concord, CA 94520 USA
[2] Santur Corp, Fremont, CA 94538 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2007年 / 25卷 / 06期
关键词
D O I
10.1116/1.2789447
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Building high-performance zone plate is a critical step for achieving nanometer resolution in advanced x-ray imaging and microscopy. Zone plates with smaller outmost zone width and higher aspect ratio are increasingly in demand, simply because the resolution and efficiency of an x-ray microscope are ultimately determined by these two features. In this paper, we will present detailed discussion of achieving high aspect ratio and high resolution x-ray zone plate through electron beam lithography, trilevel resist process and gold plating, fabrication problems, and limitations. We will also present the technique to double the aspect ratio of the zone plate and measure the results of x-ray diffraction efficiency of single and aspect ratio doubled zone plates. (c) 2007 American Vacuum Society.
引用
收藏
页码:2004 / 2007
页数:4
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