Epitaxial MnO thin films grown by pulsed laser deposition

By using pulsed laser deposition under vacuum from Mn(2)O(3) targets epitaxial MnO thin films have been grown. The substrates used were sapphire [001] and MgO [111]. Best results were achieved at a pressure of 10(-4) mbar and at substrate temperatures of 700 degrees C, The films were characterised by using grazing incidence X-ray scattering as well as theta-2 theta Bragg scattering. Part of the characterisation was done with synchrotron radiation at beamline ID20 of the ESRF/Grenoble. The films show lattice parameters close to the bulk ones. The growth direction was found to be [111]. RES measurements were used to check interdiffusion and film thickness. Typical film thicknesses were from 200 Angstrom up to 3500 Angstrom. These films have been studied by magnetic X-ray scattering experiments at the ESRF, They exhibit antiferromagnetic long range order similar to bulk crystals. (C) 1999 Elsevier Science B.V. All rights reserved.