Sensitizing DNA to secondary electron damage: Resonant formation of oxidative radicals from 5-halouracils

被引：123

作者：

Abdoul-Carime, H

Huels, MA ^{[1
]}

Illenberger, E

Sanche, L

机构：

[1] Univ Sherbrooke, Dept Med Nucl & Radiobiol, Sherbrooke, PQ J1K 2R1, Canada

[2] Free Univ Berlin, Inst Phys & Theoret Chem, D-1000 Berlin, Germany

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 123卷 / 22期

关键词：

D O I：

10.1021/ja003952d

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：5354 / 5355

页数：2

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