The effect of dislocation contrast on x-ray line broadening: A new approach to line profile analysis

被引:1093
作者
Ungar, T
Borbely, A
机构
[1] Institute for General Physics, Eötvös University Budapest, H-1445, Budapest VIII, P.O.B. 323
关键词
D O I
10.1063/1.117951
中图分类号
O59 [应用物理学];
学科分类号
摘要
The x-ray line profiles of an ultrafine grained copper crystal, produced by equal-channel angular pressing, were measured by a special high resolution diffractometer with negligible instrumental line broadening. The analysis of the line breadths and the Fourier coefficients have shown that taking into account the contrast caused by dislocations on line profiles gives new scaling factors in the Williamson-Hall plot and in the Warren-Averbach analysis, respectively. When strain is caused by dislocations the new procedure proposed here enables a straightforward determination of particle size and strain, the latter in terms of the dislocation density. (C) 1996 American Institute of Physics.
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页码:3173 / 3175
页数:3
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