In situ RHEED and XPS studies of epitaxial thin alpha-Fe2O3(0001) films on sapphire

被引:68
作者
Fujii, T
Alders, D
Voogt, FC
Hibma, T
Thole, BT
Sawatzky, GA
机构
[1] UNIV GRONINGEN,DEPT CHEM PHYS,CTR MAT SCI,NL-9747 AG GRONINGEN,NETHERLANDS
[2] OKAYAMA UNIV,FAC ENGN,DEPT APPL CHEM,OKAYAMA 700,JAPAN
关键词
epitaxy; iron oxide; molecular beam epitaxy; reflection high-energy electron diffraction (RHEED); X-ray photoelectron spectroscopy (XPS);
D O I
10.1016/0039-6028(96)00844-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In situ RHEED and XPS measurements of epitaxial alpha-Fe2O3(0001) films are reported as a function of the number of deposited monolayers. The films were prepared on alpha-Al2O3(0001) substrates by MBE. The RHEED patterns suggest that layer-by-layer growth of alpha-Fe2O3(0001) occurs for the first few monolayers. Subsequently, the growth mode changes to three-dimensional growth. The in-plane lattice constant of the first monolayer of alpha-Fe2O3(0001) is expanded relative to that of the bulk, although in the case of lattice matching between alpha-Al2O3 and alpha-Fe2O3 a contraction would be expected. This can be explained by assuming a basic hexagonal structure for the first monolayer with a random distribution of ferric ions over the octahedral sites between the close-packed oxygen layers. Beyond the first monolayer, the ordered corundum structure is formed. The lineshapes of the XPS Fe 2p core level spectra are also found to be thickness-dependent. The deviation of the Madelung potential at the surface shifts the positions of the Fe 2p peaks to lower binding energies. For the first few monolayers, the satellite intensity is reduced because the interplanar contraction leads to a shorter Fe-O distance.
引用
收藏
页码:579 / 586
页数:8
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