Micromagnetic simulation of tunneling magnetoresistance junctions with parallel hard bias

被引:1
作者
Gibbons, MR
Sin, K
Funada, S
Mao, M
Rao, D
Chien, C
Tong, HC
机构
[1] Read Rite Corp, Fremont, CA 94539 USA
[2] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94500 USA
关键词
D O I
10.1063/1.1355331
中图分类号
O59 [应用物理学];
学科分类号
摘要
Tunneling magnetoresistance (TMR) films and devices were simulated to understand the response of the free layer with a parallel hard bias. In order to determine the effect of the granular hard bias material micromagnetic simulation was used to model both the hard bias and TMR material. Minimizing hysteresis and Barkhausen jumps in the response of the device involves an optimization of the spacing between the free layer and the hard bias coupled with the shape of the device edges. (C) 2001 American Institute of Physics.
引用
收藏
页码:7003 / 7005
页数:3
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