Surface pre-melting and surface flattening of Bi nanofilms on Si(111)-7x7

被引：39

作者：

Yaginuma, S

Nagao, T ^{[1
]}

Sadowski, JT

Pucci, A

Fujikawa, Y

Sakurai, T

机构：

[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

[2] Univ Heidelberg, Kirchhoff Inst Phys, D-69120 Heidelberg, Germany

来源：

SURFACE SCIENCE | 2003年 / 547卷 / 03期

关键词：

surface melting; surface structure; morphology; roughness; and topography; surface thermodynamics (including phase; transitions); low energy electron diffraction (LEED); metallic films; bismuth;

D O I：

10.1016/j.susc.2003.10.015

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report on the in situ observation of temperature-driven drastic morphology evolution and surface pre-melting of the Bi(0 0 1) nanofilm deposited on the Si(1 1 1)-7 x 7 surface by use of spot-profile-analyzing low-energy electron diffraction (SPA-LEED). Surface step density of the single-crystalline, epitaxial Bi(0 0 1) film decreases above 350 K in a critical manner. On annealed Bi(0 0 1) films, we have detected surface pre-melting with a transition temperature of 350 K, which yields reversible diffraction intensity drop in addition to the harmonic Debye-Waller behavior. The observed surface flattening of the as-deposited film is driven by the increased amount of mobile adatoms created through the surface pre-melting. (C) 2003 Published by Elsevier B.V.

引用

页码：L877 / L881

页数：5

共 16 条

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