Photolithographic micropatterning of an electroluminescent polymer using photobase generator

被引：23

作者：

Lee, SK

Jung, BJ

Ahn, T

Song, IS

Shim, HK

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem, Ctr Adv Funct Polymers, Taejon 305701, South Korea

[2] Korea Adv Inst Sci & Technol, Sch Mol Sci, Taejon 305701, South Korea

[3] Samsung Adv Inst Technol, Elect Mat Lab, Suwon 440600, South Korea

来源：

MACROMOLECULES | 2003年 / 36卷 / 24期

关键词：

D O I：

10.1021/ma034928y

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Photolithographic micropatterning method was described for conjugated polymer using photobase generator (PBG). The patterned emission image of photopatternable polymer fabricated by the photolithographic method was displayed. The photochemical cleavage of the photosensitive protecting groups was illustrated. The infrared spectra of thermally eliminated and photopatternable polymers with PBG showed the strong absorption at 961 cm -1 in comparison to the halo-precursor polymer.

引用

收藏

页码：9252 / 9256

页数：5

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