Analysis of nanostructure formation using photon/electron spectroscopies: Cu on SiC substrates

被引:5
作者
An, ZL [1 ]
Hirai, M [1 ]
Kusaka, M [1 ]
Saitoh, T [1 ]
Iwami, M [1 ]
机构
[1] Okayama Univ, Fac Sci, Surface Sci Res Lab, Okayama 7008530, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 3B期
关键词
Cu; nanostructure; SiC; AES; LEED; X-ray emission analysis;
D O I
10.1143/JJAP.40.1927
中图分类号
O59 [应用物理学];
学科分类号
摘要
Auger electron spectroscopy (AES) and low-energy electron diffraction (LEED) studies of Cu deposition on a 6H-SiC(0001) surface have shown fine-particle formation with an average size of approximately 2 nm for a 6H-SiC(0001) C-face at a nominal Cu coverage of approximately 2 ML, where its size depends on the nominal Cu film thickness. Soft-X-ray emission spectroscopy (SXES) of an annealed Cu(60 nm)/3C-SiC(001) specimen clarified that little reaction occurred at the Cu/SiC interface. The heated specimen is considered to have Cu islands on top.
引用
收藏
页码:1927 / 1928
页数:2
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