Stacking fault energy of 6H-SiC and 4H-SiC single crystals

被引:10
作者
Hong, MH [1 ]
Samant, AV [1 ]
Pirouz, P [1 ]
机构
[1] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA
来源
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2 | 2000年 / 338-3卷
关键词
4H-SiC; 6H-SiC; ANNNI spin model; deformation; dissociation width; stacking fault energy;
D O I
10.4028/www.scientific.net/MSF.338-342.513
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Single crystal 4H and 6H polytypes of SiC have been deformed in compression at 1300 degreesC. Using two-beam bright-field and weak-beam dark-field techniques of TEM, the stacking fault energy of these two SiC polytypes has been determined to be 14.7+/-2.5 mJ/m(2) (4H-SiC) and 2.9+/-0.6 mJ/m(2) (6H-SiC). The experimental values of stacking fault energy for 4H- and 6H-SiC have been compared with estimates obtained from a generalized axial next-nearest-neighbor Ising (ANNNI) spin model. I is found that the theoretical models predict the lower stacking fault energy of 6H-SiC compared to that of 4H-SiC, and the predicted energies are, respectively, within 5% and 40% of the experimental values.
引用
收藏
页码:513 / 516
页数:4
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