Temperature/light dependent development of selective resistance to photoinhibition of photosystem I

被引:113
作者
Ivanov, AG
Morgan, RM
Gray, GR
Velitchkova, MY
Huner, NPA
机构
[1] Univ Western Ontario, Dept Plant Sci, London, ON N6H 5B7, Canada
[2] Bulgarian Acad Sci, Inst Biophys, BU-1113 Sofia, Bulgaria
[3] Michigan State Univ, MSU DOE Plant Res Lab, E Lansing, MI 48824 USA
基金
加拿大自然科学与工程研究理事会;
关键词
photosystem I; photoinhibition; P700; intersystem electron pool; excitation pressure; low temperature;
D O I
10.1016/S0014-5793(98)00681-4
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
Exposure of winter rye leaves grown at 20 degrees C and an irradiance of either 50 or 250 mu mol m(-2) s(-1) to high light stress (1600 mu mol m(-2) s(-1), 4 h) at 5 degrees C resulted in photoinhibition of PSI measured in vivo as a 34% and 31% decrease in Delta A(820)/A(820) (P700(+)). The same effect was registered in plants grown at 5 degrees C and 50 mu mol m(-2) s(-1). This was accompanied by a parallel degradation of the PsaA/PsaB heterodimer, increase of the intersystem e(-) pool size as well as inhibition of PSII photochemistry measured as F-v/F-m. Surprisingly, plants acclimated to high light (800 mu mol m(-2) s(-1)) or to 5 degrees C and moderate light (250 mu mol m(-2) s(-1)) were fully resistant to photoinhibition of PSI and did not exhibit any measurable changes at the level of PSI heterodimer abundance and intersystem e- pool size, although PSII photochemistry was reduced to 66% and 64% respectively. Thus, we show for the first time that PSI, unlike PSII, becomes completely resistant to photoinhibition when plants are acclimated to either 20 degrees C/800 mu mol m(-2) s(-1) or 5 degrees C/ 250 mu mol m(-2) s(-1) as a response to growth at elevated excitation pressure. The role of temperature/light dependent acclimation in the induction of selective tolerance to PSI photoinactivation is discussed. (C) 1998 Federation of European Biochemical Societies.
引用
收藏
页码:288 / 292
页数:5
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