X-ray stepper development for volume production at Canon

被引：3

作者：

Uda, K ^{[1
]}

Mizusawa, N ^{[1
]}

Tanaka, Y ^{[1
]}

Watanabe, Y ^{[1
]}

Ina, H ^{[1
]}

Uzawa, S ^{[1
]}

机构：

[1] Canon Inc, Nanotechnol Res Ctr, Utsunomiya, Tochigi 32132, Japan

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES II | 1998年 / 3331卷

关键词：

x-ray lithography; SR stepper; full field exposure; alignment; magnification correction; proximity gap;

D O I：

10.1117/12.309632

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe some results of exposure experiments using the present prototype SR stepper which Canon has developed and the novel technology development which is necessary to establish the next generation SR stepper for volume production. Concerning the technology development, we have established (1) Two mirror condensing system for full field exposure, (2) ADGL alignment method, (3) Magnification correction method, (4) High speed stage stepping method. By adopting these technologies, we have been developing a beta-site machine for volume production and its features and preliminary specifications are described.

引用

页码：689 / 697

页数：9