Ultra-low thermal conductivity in W/Al2O3 nanolaminates

被引:313
作者
Costescu, RM
Cahill, DG
Fabreguette, FH
Sechrist, ZA
George, SM
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA
关键词
D O I
10.1126/science.1093711
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Al2O3. With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of similar to0.6 watts per meter per kelvin. This result suggests that high densities of interfaces between dissimilar materials may provide a route for the production of thermal barriers with ultra-low thermal conductivity.
引用
收藏
页码:989 / 990
页数:2
相关论文
共 18 条
  • [1] Nanoscale thermal transport
    Cahill, DG
    Ford, WK
    Goodson, KE
    Mahan, GD
    Majumdar, A
    Maris, HJ
    Merlin, R
    Phillpot, SR
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (02) : 793 - 818
  • [2] Thermometry and thermal transport in micro/nanoscale solid-state devices and structures
    Cahill, DG
    Goodson, KE
    Majumdar, A
    [J]. JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 2002, 124 (02): : 223 - 241
  • [3] Thermal conductance of epitaxial interfaces
    Costescu, RM
    Wall, MA
    Cahill, DG
    [J]. PHYSICAL REVIEW B, 2003, 67 (05)
  • [4] SURFACE-CHEMISTRY OF AL2O3 DEPOSITION USING AL(CH3)(3) AND H2O IN A BINARY REACTION SEQUENCE
    DILLON, AC
    OTT, AW
    WAY, JD
    GEORGE, SM
    [J]. SURFACE SCIENCE, 1995, 322 (1-3) : 230 - 242
  • [6] Thermal conduction in nonhomogeneous CVD diamond layers in electronic microstructures
    Goodson, KE
    [J]. JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 1996, 118 (02): : 279 - 286
  • [7] HASSELMAN DPH, 1987, AM CERAM SOC BULL, V66, P799
  • [8] Thermal conductivity of Si/SiGe and SiGe/SiGe superlattices
    Huxtable, ST
    Abramson, AR
    Tien, CL
    Majumdar, A
    LaBounty, C
    Fan, X
    Zeng, GH
    Bowers, JE
    Shakouri, A
    Croke, ET
    [J]. APPLIED PHYSICS LETTERS, 2002, 80 (10) : 1737 - 1739
  • [9] Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction
    Klaus, JW
    Ferro, SJ
    George, SM
    [J]. THIN SOLID FILMS, 2000, 360 (1-2) : 145 - 153
  • [10] THERMAL-CONDUCTIVITY OF SPUTTERED OXIDE-FILMS
    LEE, SM
    CAHILL, DG
    ALLEN, TH
    [J]. PHYSICAL REVIEW B, 1995, 52 (01): : 253 - 257