Avalanche ionization and dielectric breakdown in silicon with ultrafast laser pulses

被引:171
作者
Pronko, PP [1 ]
VanRompay, PA
Horvath, C
Loesel, F
Juhasz, T
Liu, X
Mourou, G
机构
[1] Univ Michigan, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 05期
关键词
D O I
10.1103/PhysRevB.58.2387
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Experimental evidence is presented demonstrating avalanche ionization as the dominant mechanism for dielectric breakdown in silicon with ultrafast laser pulses at above-gap photon energies. Data are presented for pulses between 80 fs and 9 ns at 786 nm and 1.06 mu m. Associated electric fields range from 0.3 to 40 MV/cm. Avalanche ionization coefficients range from 10(10) to 10(14) s(-1) and are discussed in relation to semiempirical de ionization theory and recent ac Monte Carlo calculations. Correlation is obtained between electron collision times and associated ionization rates.
引用
收藏
页码:2387 / 2390
页数:4
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