Synthesis of polyallyl dendrimers to apply to novel UV curing materials

被引：9

作者：

Aoki, Ken'ichi ^{[1
,2
]}

Ichimura, Kunihiro ^{[1
,2
]}

机构：

[1] Toho Univ, Fac Sci, Ctr Adv Photopolymers, Chiba 2748510, Japan

[2] Toho Univ, Res Ctr Mat Integrated Properties, Chiba 2748510, Japan

来源：

关键词：

polyallyl dendrimer; polythiol; thiol-ene photopolymerization; UV curing;

D O I：

10.2494/photopolymer.21.75

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：75 / 76

页数：2

共 5 条

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Hoyle, CE ;

Lee, TY ;

Roper, T .

[2]

JACOBINE AF, 1993, CURING POLYM SCI TEC, V3, pP219

Kim, YB ;

Kim, HK ;

Choi, HC ;

Hong, JW .

Sangermano, M ;

Bongiovanni, R ;

Malucelli, G ;

Priola, A ;

Harden, A ;

Rehnberg, N .

[5]

Wan QC, 2000, J MACROMOL SCI PURE, V37, P1317, DOI 10.1081/MA-100101156