Sequential versus non-sequential double ionization in strong laser fields

被引:22
作者
van der Hart, HW [1 ]
机构
[1] Queens Univ Belfast, Dept Appl Math & Theoret Phys, Belfast BT7 1NN, Antrim, North Ireland
关键词
D O I
10.1088/0953-4075/33/20/107
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The recollision model has been applied to separate the probability for double ionization into contributions from electron-impact ionization and electron-impact excitation for intensities at which the dielectronic interaction is important for generating double ionization. For a wavelength of 780 am, electron-impact excitation dominates just above the threshold intensity for double ionization, approximate to 1.2 x 10(14) W cm(-2), with electron-impact ionization becoming more important for higher intensities. For a wavelength of 390 nm, the ratio between electron-impact ionization and electron-impact excitation remains fairly constant for all intensities above the threshold intensity for double ionization, approximate to 6 x 10(14) W cm(-2). The results point to an explanation of the experimental results, but more detailed calculations on the behaviour of excited He+ ions are required.
引用
收藏
页码:L699 / L705
页数:7
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