Surface modification of titanium oxide in pulse-modulated induction thermal plasma

被引:20
作者
Ishigaki, T
Haneda, H
Okada, N
Ito, S
机构
[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan
[2] Tokyo Univ Sci, Dept Ind Chem, Noda, Chiba 2788510, Japan
关键词
thermal plasma processing; plasma modulation; RF inductively coupled plasma; titanium oxide;
D O I
10.1016/S0040-6090(01)00935-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recently, it was reported that RF induction plasma of a purse-modulated operating mode had been successfully generated, for the first time, at a sufficiently high electric power level for materials processing. The unique conditions in the plasma, such as a non-equilibrium situation at the instance of pulse-on and -off and the increase of chemically reactive radical species, as well as the time-dependent change of plasma temperature, is expected to offer the unique physico-chemical conditions necessary for materials processing. As the first step of the work directed to materials processing, the thermal and chemical interactions between plasma and solid materials were examined for both cases of pulse-modulated and continuous modes. Green compacts of titanium dioxide (TiO2), whose characteristics strongly depend on the formation of lattice defects and the incorporation of hydrogen, were treated in Ar-H-2 plasma of continuous and pulse-modulated generation modes. The oxide disks were placed at the downstream of plasma flow. The sample position and the plasma generation pressure were changed as processing parameters. The plasma-treated specimens were characterized by X-ray diffractometry and the hydrogen content was measured. The plasma treatment gave a thermal effect, rather than a chemical one, on the surface of oxide specimens. The oxides were thermally reduced by the plasma treatment and showed a change of color at the surface, while XRD did not show a change of crystal structure. Comparing specimens treated in the pulse-modulated plasma with those treated in the continuous plasma, the disk specimens had less of a thermal effect on the plasma. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:20 / 25
页数:6
相关论文
共 11 条
[1]   THE INTERACTION OF H2O WITH A TIO2(110) SURFACE [J].
HUGENSCHMIDT, MB ;
GAMBLE, L ;
CAMPBELL, CT .
SURFACE SCIENCE, 1994, 302 (03) :329-340
[2]   Generation of pulse-modulated induction thermal plasma at atmospheric pressure [J].
Ishigaki, T ;
Fan, XB ;
Sakuta, T ;
Banjo, T ;
Shibuya, Y .
APPLIED PHYSICS LETTERS, 1997, 71 (26) :3787-3789
[3]   Pulse-modulated RF thermal plasma for advanced materials processing [J].
Ishigaki, T ;
Sakuta, T .
JOURNAL OF INTELLIGENT MATERIAL SYSTEMS AND STRUCTURES, 1999, 10 (07) :565-568
[4]   Thermal plasma treatment of titanium carbide powders .2. In-flight formation of carbon-site vacancies and subsequent nitridation in titanium carbide powders during induction plasma treatment [J].
Ishigaki, T ;
Moriyoshi, Y ;
Watanabe, T ;
Kanzawa, A .
JOURNAL OF MATERIALS RESEARCH, 1996, 11 (11) :2811-2824
[5]  
ISHIGAKI T, 1999, P 14 INT S PLASM CHE, V2, P915
[6]   DIFFUSION OF H AND D IN TIO2 - SUPPRESSION OF INTERNAL FIELDS BY ISOTOPE-EXCHANGE [J].
JOHNSON, OW ;
PAEK, SH ;
DEFORD, JW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (03) :1026-1033
[7]   Hydrogen molecules in crystalline silicon treated with atomic hydrogen [J].
Murakami, K ;
Fukata, N ;
Sasaki, S ;
Ishioka, K ;
Kitajima, M ;
Fujimura, S ;
Kikuchi, J ;
Haneda, H .
PHYSICAL REVIEW LETTERS, 1996, 77 (15) :3161-3164
[8]   Effects of plasma diameter and operating frequency on dynamic behaviour of induction thermal plasma [J].
Sakuta, T. ;
Oguri, S. ;
Takashima, T. ;
Boulos, M. I. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01) :67-71
[9]   Non-equilibrium effects in pulse modulated induction thermal plasma for advanced material processing [J].
Sakuta, T ;
Ishigaki, T .
PURE AND APPLIED CHEMISTRY, 1999, 71 (10) :1845-1852
[10]   Preparation of visible-light-responsive titanium oxide photocatalysts by plasma treatment [J].
Takeuchi, K ;
Nakamura, I ;
Matsumoto, O ;
Sugihara, S ;
Ando, M ;
Ihara, T .
CHEMISTRY LETTERS, 2000, (12) :1354-1355