Use of infrared imagery in characterization of chemical vapor deposition reactors

被引:5
作者
Hyer, PV
机构
[1] Lockheed Martin Eng. and Science Co., NASA Langley Research Center, Mail Stop 473, Hampton
关键词
chemical vapor deposition; gas dynamics; infrared; photogrammetry;
D O I
10.1016/S1350-4495(96)00023-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Infrared imagery was obtained of the exterior surfaces of a horizontal chemical vapor deposition reactor. These data revealed significant differences in flow pattern between hydrogen and nitrogen gases. The infrared pixel data were transformed into reactor coordinates and then merged with a three-dimensional data file of the reactor's external topology to create three-dimensional thermal maps of the exterior reactor surface. Such maps can prove useful both in helping to specify boundary conditions for modeling purposes and in revealing gross patterns in the flow.
引用
收藏
页码:17 / 24
页数:8
相关论文
共 3 条
[1]  
BEYER WD, 1984, CRC STANDARD MATH TA, P199
[2]  
BURNER AW, 1985, P 51 ANN M ASP, V1, P62
[3]  
DHATT G, 1984, FINITE ELEMENT METHO, P102