Atmospheric glow stabilization. Do we need pre-ionization?

被引:28
作者
Aldea, E
Peeters, P
De Vries, H
Van De Sanden, MCM
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
[2] Fuji Photofilm BV, Tilburg, Netherlands
关键词
plasma stability; surface effect; electronic feedback;
D O I
10.1016/j.surfcoat.2005.01.052
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper a discussion of the generation and stability mechanisms of the atmospheric glow plasma is presented. In contrast to conventional wisdom it is concluded that the generation of the stable atmospheric glow is unlikely to be related to a pre-breakdown preionization mechanism. It is argued that the key issue that must be overcome for stable plasma generation is the glow to arc transition. The specific nature of the dielectric barrier material and an electronic stabilization of the fast current variations during breakdown lead to stable atmospheric glow generation. (c) 2005 Elsevier B.V All rights reserved.
引用
收藏
页码:46 / 50
页数:5
相关论文
共 17 条
[1]   SUPPRESSION OF GLOW-TO-ARC TRANSITION IN ATMOSPHERIC-PRESSURE GAS-DISCHARGE OF TEA CO2-LASER BY HIGH-FREQUENCY CORONA DISCHARGES [J].
AKIYAMA, H ;
TAKAMATSU, T ;
YAMABE, C ;
HORII, K .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1984, 17 (11) :1014-1017
[2]  
ALDEA E, 2003, ISPC5121, P9
[3]  
DEVRIES H, Patent No. 6774569
[4]  
DEVRIES H, Patent No. 1381257
[5]  
DEVRIES H, Patent No. 20040007985
[6]   Transition from glow silent discharge to micro-discharges in nitrogen gas [J].
Gherardi, N ;
Gouda, G ;
Gat, E ;
Ricard, A ;
Massines, F .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (03) :340-346
[7]   Influence of interaction between charged particles and dielectric surface over a homogeneous barrier discharge in nitrogen [J].
Golubovskii, YB ;
Maiorov, VA ;
Behnke, J ;
Behnke, JF .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (08) :751-761
[8]  
Hakiai K, 1999, ELECTR ENG JPN, V127, P8, DOI 10.1002/(SICI)1520-6416(19990430)127:2<8::AID-EEJ2>3.0.CO
[9]  
2-H
[10]  
JICHUL S, 2003, J APPL PHYS, V94, P7408