Pressure-assisted capillary force lithography

被引：47

作者：

Khang, DY ^{[1
]}

Lee, HH ^{[1
]}

机构：

[1] Seoul Natl Univ, Sch Chem Engn, Seoul 151742, South Korea

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 02期

关键词：

D O I：

10.1002/adma.200305673

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Pressure-assisted capillary force L lithography is introduced using a permeable fluoropolymer material as a mold. Slight pressing (similar to 2-3 bar), when combined with a newly developed experimental set-up, ensures conformal contact between the stiff fluoropolymer mold and the substrate. The stiff nature of the mold material makes it possible to pattern sub-100 nm features (see Figure and cover).

引用

页码：176 / +

页数：5

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