Energy flow in light-coupling masks for lensless optical lithography

被引：16

作者：

Martin, OJF ^{[1
]}

Piller, NB

Schmid, H

Biebuyck, H

Michel, B

机构：

[1] ETH Zentrum, Swiss Fed Inst Technol, Electromagnet Fields & Microwave Elect Lab, CH-8092 Zurich, Switzerland

[2] IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland

来源：

OPTICS EXPRESS | 1998年 / 3卷 / 07期

关键词：

D O I：

10.1364/OE.3.000280

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist. (C) 1998 Optical Society of America

引用

页码：280 / 285

页数：6

共 6 条

[1] Lithography beyond light: Microcontact printing with monolayer resists
Biebuyck, HA
Larsen, NB
Delamarche, E
Michel, B
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1997, 41 (1-2) : 159 - 170
[2] Electromagnetic scattering in polarizable backgrounds
Martin, OJF
Piller, NB
[J]. PHYSICAL REVIEW E, 1998, 58 (03): : 3909 - 3915
[3] Increasing the performance of the coupled-dipole approximation: A spectral approach
Piller, NB
Martin, OJF
[J]. IEEE TRANSACTIONS ON ANTENNAS AND PROPAGATION, 1998, 46 (08) : 1126 - 1137
[4] Light-coupling masks for lensless, sub-wavelength optical lithography
Schmid, H
Biebuyck, H
Michel, B
Martin, OJF
[J]. APPLIED PHYSICS LETTERS, 1998, 72 (19) : 2379 - 2381
[5] SCHMID H, 1998, IN PRESS J VAC SCI B
[6] 1997, IBM J RES DEV, V41

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