Atomistic modeling of shock-induced void collapse in copper -: art. no. 161902

被引:112
作者
Dávila, LP
Erhart, P
Bringa, EM
Meyers, MA
Lubarda, VA
Schneider, MS
Becker, R
Kumar, M
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
[2] Tech Univ Darmstadt, Inst Mat Wissensch, D-64287 Darmstadt, Germany
[3] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA
[4] Univ Calif San Diego, Dept Mech & Aerosp Engn, La Jolla, CA 92093 USA
关键词
D O I
10.1063/1.1906307
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nonequilibrium molecular-dynamics (MD) simulations show that shock-induced void collapse in copper occurs by emission of shear loops. These loops carry away the vacancies which comprise the void. The growth of the loops continues even after they collide and form sessile junctions, creating a hardened region around the collapsing void. The scenario seen in our simulations differs from current models that assume that prismatic loop emission is responsible for void collapse. We propose a dislocation-based model that gives excellent agreement with the stress threshold found in the MD simulations for void collapse as a function of void radius. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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