A new low energy electron microscope

被引：61

作者：

Tromp, RM

Mankos, M

Reuter, MC

Ellis, AW

Copel, M

机构：

[1] IBM Corp, Div Res, TJ Watson Res Ctr, Yorktown Heights, NY 10598 USA

[2] ETEC Syst Inc, Hayward, CA 94545 USA

来源：

SURFACE REVIEW AND LETTERS | 1998年 / 5卷 / 06期

关键词：

D O I：

10.1142/S0218625X98001523

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Low energy electron microscopy (LEEM) has developed into one of the premier techniques for in situ studies of surface dynamical processes, such as epitaxial growth, phase transitions, chemisorption and strain relaxation phenomena. Over the last three years we have designed and constructed a new LEEM instrument, aimed at improved resolution, improved diffraction capabilities and greater ease of operation compared to present instruments.

引用

页码：1189 / 1197

页数：9

共 12 条

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