The escape probabilities of the photoelectrons from solids

被引：9

作者：

Nefedov, VI ^{[1
]}

Nefedova, IS ^{[1
]}

机构：

[1] RAS, Inst Gen & Inorgan Chem, Moscow, Russia

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1998年 / 96卷 / 1-3期

关键词：

elastic scattering; angular distribution; escape probability of the photoelectrons;

D O I：

10.1016/S0368-2048(98)00229-1

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The dependence of the escape probability of the photoelectrons from solids on the elastic mean free path, single scattering albedo, escape angle and asymmetry parameter, is calculated taking into account the photoelectron elastic scattering, The processes which lead to differences between the calculated values and the straight line approximation, and the connection of the escape probability with attenuation length and XPS-intensities are discussed. The escape probability can have a maximum at other than the very surface in some cases. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

收藏

页码：135 / 140

页数：6

相关论文

共 12 条

[1] NEW TECHNIQUE FOR INVESTIGATION OF ANGULAR-DISTRIBUTION OF PHOTOEMISSION FROM SOLIDS - DEMONSTRATION OF THE EFFECT OF ELASTIC-SCATTERING [J].

BASCHENKO, OA ;

MACHAVARIANI, GV ;

NEFEDOV, VI .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1984, 34 (03) :305-308

[2] RELATIVE INTENSITIES IN X-RAY PHOTO-ELECTRON SPECTRA .9. ESTIMATES FOR PHOTO-ELECTRON MEAN FREE PATHS TAKING INTO ACCOUNT ELASTIC COLLISIONS IN A SOLID [J].

BASCHENKO, OA ;

NEFEDOV, VI .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1982, 27 (02) :109-118

[3] RELATIVE INTENSITIES IN X-RAY PHOTOELECTRON-SPECTRA .7. THE EFFECT OF ELASTIC-SCATTERING IN A SOLID ON THE ANGULAR-DISTRIBUTION OF PHOTOELECTRONS ESCAPING FROM SAMPLES COVERED WITH THIN-FILMS OF VARIOUS THICKNESSES [J].

BASCHENKO, OA ;

NEFEDOV, VI .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1980, 21 (02) :153-169

[4]

BASCHENKO OA, 1979, J ELECT SPECTROSC RE, V17, P409

[5] A PRACTICAL DEPTH DISTRIBUTION FUNCTION FOR ANGLE-RESOLVED AUGER-PHOTOELECTRON SPECTROSCOPY [J].

DWYER, VM .

SURFACE SCIENCE, 1994, 310 (1-3) :L621-L624

[6]

HUSEK S, 1997, J ELECT SPECTROSC RE, V85, P257

[7] ANGULAR-DISTRIBUTION OF PHOTOEMISSION FROM AMORPHOUS AND POLYCRYSTALLINE SOLIDS [J].

JABLONSKI, A ;

ZEMEK, J .

PHYSICAL REVIEW B, 1993, 48 (07) :4799-4805

[8] COMPARISON OF ELECTRON ATTENUATION LENGTHS AND ESCAPE DEPTHS WITH INELASTIC MEAN FREE PATHS [J].

JABLONSKI, A ;

EBEL, H .

SURFACE AND INTERFACE ANALYSIS, 1988, 11 (12) :627-632

[9] Mean escape depth of signal photoelectrons from amorphous and polycrystalline solids [J].

Jablonski, A ;

Tilinin, IS ;

Powell, CJ .

PHYSICAL REVIEW B, 1996, 54 (15) :10927-10937

[10] Account of photoelectron elastic determination of overlayer thickness, in-depth profiling, escape depth, attenuation coefficients and intensities in surface systems [J].

Nefedov, VI ;

Fedorova, IS .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1997, 85 (03) :221-248