Thermally driven defect formation and blocking layers at metal-ZnO interfaces

被引:38
作者
Mosbacker, H. L. [1 ]
Zgrabik, C.
Hetzer, M. J.
Swain, A.
Look, D. C.
Cantwell, G.
Zhang, J.
Song, J. J.
Brillson, L. J.
机构
[1] Ohio State Univ, Dept Phys, Columbus, OH 43210 USA
[2] Columbus Sch Girls, Bexley, OH 43209 USA
[3] Wright State Univ, Semicond Res Ctr, Dayton, OH 45433 USA
[4] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[5] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[6] Univ Calif San Diego, Dept Elect & Comp Engn, San Diego, CA 92103 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2772664
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors used depth-resolved cathodoluminescence spectroscopy and current-voltage measurements to probe the temperature-dependent formation of native point defects and reaction layers at metal-ZnO interfaces and their effect on transport properties. These results identify characteristic defect emissions corresponding to metal-Zn alloy versus oxide formation. Au alloys with Zn above its eutectic temperature, while Ta forms oxide blocking layers that reduce current by orders of magnitude at intermediate temperatures. Defects generated at higher temperatures and/or with higher initial defect densities for all interfaces produce Ohmic contacts. These reactions and defect formation with annealing reveal a thermodynamic control of blocking versus Ohmic contacts. (C) 2007 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 15 条
[1]  
Brandes E. A., 1983, SMITHELLS METALS REF, P94
[2]   Dominant effect of near-interface native point defects on ZnO Schottky barriers [J].
Brillson, L. J. ;
Mosbacker, H. L. ;
Hetzer, M. J. ;
Strzhemechny, Y. ;
Jessen, G. H. ;
Look, D. C. ;
Cantwell, G. ;
Zhang, J. ;
Song, J. J. .
APPLIED PHYSICS LETTERS, 2007, 90 (10)
[3]   Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications [J].
Chaneliere, C ;
Autran, JL ;
Devine, RAB ;
Balland, B .
MATERIALS SCIENCE & ENGINEERING R-REPORTS, 1998, 22 (06) :269-322
[4]   Contacts to ZnO [J].
Ip, K ;
Thaler, GT ;
Yang, HS ;
Han, SY ;
Li, YJ ;
Norton, DP ;
Pearton, SJ ;
Jang, SW ;
Ren, F .
JOURNAL OF CRYSTAL GROWTH, 2006, 287 (01) :149-156
[5]   Oxygen vacancies in ZnO [J].
Janotti, A ;
Van de Walle, CG .
APPLIED PHYSICS LETTERS, 2005, 87 (12) :1-3
[6]   First-principles study of native point defects in ZnO [J].
Kohan, AF ;
Ceder, G ;
Morgan, D ;
Van de Walle, CG .
PHYSICAL REVIEW B, 2000, 61 (22) :15019-15027
[7]  
KUBASCHEWSKI O, 1993, MAT THERMOCHEMISTRY, P312
[8]   Progress in ZnO materials and devices [J].
Look, David C. .
JOURNAL OF ELECTRONIC MATERIALS, 2006, 35 (06) :1299-1305
[9]   Role of subsurface defects in metal-ZnO(0001) Schottky barrier formation [J].
Mosbacker, H. L. ;
El Hage, S. ;
Gonzalez, M. ;
Ringel, S. A. ;
Hetzer, M. ;
Look, D. C. ;
Cantwell, G. ;
Zhang, J. ;
Song, J. J. ;
Brillson, L. J. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (04) :1405-1411
[10]   Role of near-surface states in ohmic-Schottky conversion of Au contacts to ZnO [J].
Mosbacker, HL ;
Strzhemechny, YM ;
White, BD ;
Smith, PE ;
Look, DC ;
Reynolds, DC ;
Litton, CW ;
Brillson, LJ .
APPLIED PHYSICS LETTERS, 2005, 87 (01)