Current injection from a metal to a disordered hopping system.: I.: Monte Carlo simulation

被引:159
作者
Wolf, U
Arkhipov, VI
Bässler, H
机构
[1] Univ Marburg, Inst Phys Chem Makromol Chem & Kernchem, D-35032 Marburg, Germany
[2] Univ Marburg, Zentrum Mat Wissenschaften, D-35032 Marburg, Germany
来源
PHYSICAL REVIEW B | 1999年 / 59卷 / 11期
关键词
D O I
10.1103/PhysRevB.59.7507
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Emission-limited charge-carrier injection in the dark from a metal into a random organic dielectric has been studied via Monte Carlo simulations. The dielectric has been modelled in terms of a regular lattice of point sites featuring a Gaussian distribution of energies to represent disorder. The essential input parameters are the zero-field energy barrier for injection (Delta), the variance (sigma) of the distribution of the hopping states, electric field, and temperature. By varying the jump distance the unimportance of long-range tunneling transitions has been established. Therefore, Fowler-Nordheim type j(F) charcteristics at high fields have to be considered accidental. The dependence of the injection yield resembles that of Richardson-Schottky (RS) thermionic emission. Quantitative differences are noted, however, concerning the RS coefficient and the temperature dependence. The latter tends to saturate at low temperatures, which is a signature of hopping among sites distributed in energy. [S0163-1829(99)08411-8].
引用
收藏
页码:7507 / 7513
页数:7
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