Nanopatterning of vapor-deposited aminosilane film using EB lithography for ferritin protein adsorption

被引:19
作者
Kumagai, S
Yoshii, S
Yamada, K
Fujiwara, I
Matsukawa, N
Yamashita, I
机构
[1] Matsushita Elect Ind Co Ltd, Adv Technol Res Labs, Kyoto 6190237, Japan
[2] Nara Inst Adv Sci & Technol, Grad Sch Mat Sci, Nara 6300101, Japan
关键词
ferritin protein; EB lithography; surface modification; aminosilane; Debye length;
D O I
10.2494/photopolymer.18.495
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
High-density ferritin nanopatterning - the protein and core complex - on a silicon substrate was achieved using nanometric patterns of amino-group modification. These patterns were made through a combination of EB lithography and vapor-phase deposition of 3-aminopropyltriethoxysilane (APTES). An appropriate buffer solution, with respect to pH and Debye length, suppressed ferritin adsorption on the SiO2 underlayer while ferritins were adsorbed with high density on a nanometer-size APTES layer. We obtained 50-nm patterned ferritins by using a solution with a 1000-nm Debye length (pH 7.0); with this solution, the attractive ferritin-APTES interaction seemed to be strong enough to overcome the repulsive ferritin-SiO2 interaction.
引用
收藏
页码:495 / 500
页数:6
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