Photoelectron spectroscopy study of the electronic structures of Al/MgF2/tris-(8-hydroxyquinoline) aluminum interfaces

被引：36

作者：

Park, Y

Lee, J

Lee, SK

Kim, DY

机构：

[1] Korea Res Inst Stand & Sci, Taejon 305600, South Korea

[2] Chonnam Natl Univ, Dept Phys, Kwangju 500757, South Korea

[3] Hallym Univ, Chem & Phys Div, Chunchon 200702, South Korea

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 01期

关键词：

D O I：

10.1063/1.1383798

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the electronic structures of Al/MgF2/tris-(8-hydroxyquinoline)aluminum (Alq(3)) interface using UV and x-ray photoelectron spectroscopy [(UPS) and (XPS), respectively]. The UPS revealed that the valence peak shift occurred with MgF2 deposition before Al was deposited and was independent of the gap state formation. The XPS core level peaks indicated that the MgF2 strongly interacted with Al and O atoms in Alq(3) even before Al was deposited, and the deposition of Al caused a slight change to the N 1s core level peak. These results indicate that the interaction mechanism in Al/MgF2/Alq(3) is different from those found in Al/LiF/Alq(3) and other metal/Alq(3). (C) 2001 American Institute of Physics.

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页码：105 / 107

页数：3

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