Micromachined silicon nitride deformable mirrors for focus control

被引：47

作者：

Himmer, PA ^{[1
]}

Dickensheets, DL ^{[1
]}

Friholm, RA ^{[1
]}

机构：

[1] Montana State Univ, Dept Elect & Comp Engn, Bozeman, MT 59717 USA

来源：

OPTICS LETTERS | 2001年 / 26卷 / 16期

关键词：

Aberrations - Boundary conditions - Deformation - Electromechanical devices - Focusing - Light interference - Micromachining - Optoelectronic devices - Silicon nitride - Voltage control;

D O I：

10.1364/OL.26.001280

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have built a 1000-mum-diameter silicon nitride deformable mirror for focus-control applications, using micro-optoelectromechanical systems technology. We achieved variable focal lengths from 36 to 360 mm. while maintaining zero primary spherical aberration, using a maximum control voltage of 100 V. Active control of spherical aberration of approximately two waves at 660 nm was demonstrated. (C) 2001 Optical Society of America.

引用

页码：1280 / 1282

页数：3

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