The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films

被引：38

作者：

Lo Savio, R. ^{[1
,2
]}

Miritello, M. ^{[1
,2
]}

Piro, A. M. ^{[1
,2
]}

Priolo, F. ^{[1
,2
]}

Iacona, F. ^{[3
]}

机构：

[1] Univ Catania, INFM, MATIS CNR, I-95123 Catania, Italy

[2] Univ Catania, Dipartimento Fis & Astron, I-95123 Catania, Italy

[3] CNR, IMM, I-95121 Catania, Italy

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 02期

关键词：

D O I：

10.1063/1.2957034

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the effects of thermal annealing performed in N(2) or O(2) ambient at 1200 degrees C on the structural and optical properties of Er silicate films having different compositions (Er(2)SiO(5), Er(2)Si(2)O(7), and their mixture). We demonstrate that the chemical composition of the stoichiometric films is preserved after the thermal treatments. All different crystalline structures formed after the thermal annealing are identified. Thermal treatments in O(2) lead to a strong enhancement of the photoluminescence intensity, owing to the efficient reduction of defect density. In particular the highest optical efficiency is associated to Er ions in the alpha phase of Er(2)Si(2)O(7). (C) 2008 American Institute of Physics.

引用

页数：3

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