UV pulsed laser deposition of magnetite thin films

被引:16
作者
Paramês, ML
Mariano, J
Rogalski, MS
Popovici, N
Conde, O [1 ]
机构
[1] Univ Lisbon, Fac Sci, Dept Phys, P-1749016 Lisbon, Portugal
[2] Univ Algarve, Fac Sci & Technol, P-8000117 Faro, Portugal
[3] Inst Super Tecn, Dept Phys, P-2780990 Oeiras, Portugal
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2005年 / 118卷 / 1-3期
关键词
magnetite; pulsed laser deposition; conversion electron Mossbauer spectroscopy; x-ray diffraction;
D O I
10.1016/j.mseb.2004.12.037
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetite thin films were grown by pulsed laserdeposition in O-2 reactive atmosphere from Fe3O4 targets. The ablated material was deposited onto Si(1 0 0) substrates at various temperatures up to 623 K. The temperature dependence of structure and stoichiometry was investigated by X-ray diffraction (XRD) and conversion electron Mossbauer spectroscopy (CEMS). The XRD results show that films grown between 483 and 623 K are obtained as pure phase magnetite with an estimated average crystallite size increasing from 14 to 35 nm, respectively. This is in agreement with the CEMS spectra analysis, indicating isomer shift and internal field values for both the T-d and O-h sites close to those reported for the bulk material and a random orientation of the magnetic moments. The influence of the deposition temperature on the estimated Fe(9-x)/3O4 stoichiometry is related to an increase in the vacancy concentration from 483 to 623 K. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:246 / 249
页数:4
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