Light-induced defect states in hydrogenated amorphous silicon centered around 1.0 and 1.2 eV from the conduction band edge

被引:18
作者
Pearce, JM [1 ]
Deng, J [1 ]
Collins, RW [1 ]
Wronski, CR [1 ]
机构
[1] Penn State Univ, Ctr Thin Film Devices, University Pk, PA 16801 USA
关键词
Conduction band edge - Hydrogenated amorphous silicon - Light induced defect states;
D O I
10.1063/1.1624637
中图分类号
O59 [应用物理学];
学科分类号
摘要
To take into account the presence of multiple light-induced defect states in hydrogenated amorphous silicon (a-Si:H) the evolution of the entire spectra of photoconductive subgap absorption, alpha(hnu), has been analyzed. Using this approach two distinctly different light-induced defect states centered around 1.0 and 1.2 eV from the conduction band edge are clearly identified. Results are presented on their evolution and respective effects on carrier recombination that clearly point to the importance of these states in evaluating the stability of different a-Si:H solar cell materials, as well as elucidating the origin of the Staebler-Wronski effect. (C) 2003 American Institute of Physics.
引用
收藏
页码:3725 / 3727
页数:3
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