Imprint with sharp tip stamps

被引：9

作者：

Borzenko, T ^{[1
]}

Tormen, M ^{[1
]}

Hock, V ^{[1
]}

Liu, J ^{[1
]}

Schmidt, G ^{[1
]}

Molenkamp, LW ^{[1
]}

机构：

[1] Univ Wurzburg, Inst Phys, D-97074 Wurzburg, Germany

来源：

MICROELECTRONIC ENGINEERING | 2001年 / 57-8卷

关键词：

nanostructures; imprint; point contacts;

D O I：

10.1016/S0167-9317(01)00445-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A technological scheme for the fabrication of metallic point contacts is presented. Nanoimprint lithography (NIL) (J. Vac. Sci. Technol. B, 14(6) (1996) 4129-4133) plays a key role in the process determining the critical dimension of the point contact. The pattern obtained by imprint has been studied by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The masking properties of the polymer film which also serves as an insulating layer in our device, separating the electrodes between which the point contact is located, have been controlled. Our study confirms that the imprint step involved in the process and the chosen thermoplastic polymer meet the requirements for fabricating nm-scale metallic point contacts. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：389 / 396

页数：8

共 10 条

[1]

BORZENKO T, 1996, THESIS RUSSIAN ACAD

[2] Imprint lithography with 25-nanometer resolution [J].