Effect of Nb-ion implantation on the oxidation resistance of TiAl

被引：27

作者：

Taniguchi, S

Shibata, T

Saeki, T

Zhang, HX

Liu, XH

机构：

[1] BEIJING NORMAL UNIV,INST LOW ENERGY NUCL PHYS,BEIJING 100875,PEOPLES R CHINA

[2] CHINESE ACAD SCI,SHANGHAI INST MET,ION BEAM LAB,SHANGHAI 200050,PEOPLES R CHINA

来源：

MATERIALS TRANSACTIONS JIM | 1996年 / 37卷 / 05期

关键词：

titanium aluminide; oxidation; temperature cycle; high temperature; niobium; implantation; alumina scale;

D O I：

10.2320/matertrans1989.37.998

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The TiAI specimens implanted with Mb ions of a dose of 1.2 x 10(21) m(-2) were subjected to isothermal and cyclic oxidation tests at 1200 K in a flow of purified oxygen under atmospheric pressure. The results were compared with those for Nb-free specimens. The implantation of Nb ions decreases the overall oxidation rate in the both tests. There is no scale spallation from the Nb-implanted specimen during the cyclic oxidation. Two kinds of scales were formed on each specimen: an alumina-rich (virtually alumina) scale and a two-layer scale which has been often observed. The implantation of Nb improves the mechanical integrity of the alumina scale and decreases the growth rate of the two-layer scale.

引用

页码：998 / 1003

页数：6

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