Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method

被引:30
作者
Yasuoka, Hiroaki [1 ]
Yoshida, Masahiro [1 ]
Sugita, Ken [1 ]
Ohdaira, Keisuke [1 ]
Murata, Hideyuki [1 ]
Matsumura, Hideki [1 ]
机构
[1] Japan Adv Inst Sci & Technol, Sch Mat Sci, Nomi, Ishikawa 9231292, Japan
关键词
catalysis; chemical vapor deposition (CVD); polytetrafluoroethylene (PTFE); hexafluoropropylene-oxide (HFPO); catalyzer; catalyst;
D O I
10.1016/j.tsf.2007.06.185
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Dependence of catalyzing materials on deposition of polytetrafluoroethylene (PTFE = "Teflon" in commercial) films by catalytic chemical vapor deposition (Cat-CVD) method is investigated. It has been clarified that Ni-containing catalyzers has a catalyzing effect that can decompose hexafluoropropylene-oxide (HFPO) to form PTFE films. A novel method named Dual Cat-CVD is also proposed. In the method, carbonized and fluorinated surface of Ni-containing catalyzer is removed and refreshed using atomic hydrogen generated by additionally introduced tungsten (W) catalyzer in the same chamber. This Dual Cat-CVD method enables to recover the deposition rate of PTFE films drastically. (c) 2007 Elsevier B.V All rights reserved.
引用
收藏
页码:687 / 690
页数:4
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