Modeling of dynamical processes in laser ablation

被引:65
作者
Leboeuf, JN
Chen, KR
Donato, JM
Geohegan, DB
Liu, CL
Puretzky, AA
Wood, RF
机构
[1] Oak Ridge National Laboratory, Oak Ridge, TN 37831-8071
关键词
D O I
10.1016/0169-4332(95)00372-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Various physics and computational. approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.
引用
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页码:14 / 23
页数:10
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