Micropatterning of metal nanoparticles via UV photolithography

被引：43

作者：

Horiuchi, S

Fujita, T

Hayakawa, T

Nakao, Y

机构：

[1] Natl Inst Adv Ind Sci & Technol Tokyo Waterfront, Res Ctr Macromol Technol, Kohtoh Ku, Tokyo 1350064, Japan

[2] Natl Inst Adv Ind Sci & Technol, Res Ctr Macromol Technol, Tsukuba, Ibaraki 3058565, Japan

[3] Natl Inst Adv Ind Sci & Technol, Nanotechnol Res Inst, Tsukuba, Ibaraki 3058565, Japan

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 17期

关键词：

D O I：

10.1002/adma.200305270

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The possibility of patterning metal nanoparticles by way of conventional UV photolithography using the unique behavior of polymethylmethacrylate (PMMA) in terms of the reduction of Pd(acac)2 was reported. It was found that UV irradiation enhances the reducing power of PMMA against Pd(acac)2. To achieve an enhancement of the reducing power in PMMA, a wavelength shorter than 300 nm was necessary.

引用

页码：1449 / 1452

页数：4

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