Fabrication and characterization of diamond-like carbon coated knife edge field emitter array

被引:6
作者
Ko, CG [1 ]
Ju, BK [1 ]
Lee, YH [1 ]
Park, JH [1 ]
Oh, MH [1 ]
机构
[1] KOREA UNIV, DEPT ELECT ENGN, SEONGBUK KU, SEOUL 136701, SOUTH KOREA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1996年 / 35卷 / 10A期
关键词
DLC; field emission; KEFEA; ODE; stability;
D O I
10.1143/JJAP.35.L1305
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricated diamond-like carbon (DLC) coated knife edge-shaped field emitter array (KEFEA) on the (110) silicon wafer. The fabricated KEFEA has more than six hundreds times of aspect ratio and about two times higher electric field at tip-apex compared with the pyramid-shaped edge field emitter array (FEA). A high quality DLC film which has similar properties to the diamond film was coated on the silicon KEFEA by PECVD method in order to improve the stability and electrical characteristics. The turn-on held was lowered from 0.18 MV/cm to 0.14 MV/cm by the DLC him coating to the pure silicon KEFEA. More than 400% of the short-term emitted current fluctuation was observed from the measurement of the pure silicon KEFEA; The DLC film coating on the pure silicon KEFEA reduced the emission current fluctuation to 15%.
引用
收藏
页码:L1305 / L1307
页数:3
相关论文
共 7 条
[1]   ANISOTROPIC ETCHING OF SILICON [J].
BEAN, KE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) :1185-1193
[2]   QUANTUM PHOTOYIELD OF DIAMOND(111) - STABLE NEGATIVE-AFFINITY EMITTER [J].
HIMPSEL, FJ ;
KNAPP, JA ;
VANVECHTEN, JA ;
EASTMAN, DE .
PHYSICAL REVIEW B, 1979, 20 (02) :624-627
[3]  
KO CG, 1995, P 2 KOR C SEM, P189
[4]   KNIFE-EDGE THIN-FILM FIELD-EMISSION CATHODES ON (110) SILICON-WAFERS [J].
LEE, B ;
ELLIOTT, TS ;
MAZUMDAR, TK ;
MCINTYRE, PM ;
PANG, Y ;
TROST, HJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02) :644-647
[5]  
LIU J, 1994, P 7 IVMC 94, P104
[6]   VACUUM MICROELECTRONICS - WHATS NEW AND EXCITING - KEYNOTE ADDRESS [J].
UTSUMI, T .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (10) :2276-2283
[7]   CHEMICAL-VAPOR-DEPOSITION AND PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION CARBONIZATION OF SILICON MICROTIPS [J].
ZHIRNOV, VV ;
GIVARGIZOV, EI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02) :633-637