A systematic approach for integrated trend analysis-The case of etching

被引：17

作者：

Wu, Feng-Shang ^{[2
]}

Hsu, Chun-Chi ^{[2
]}

Lee, Pei-Chun ^{[1
,2
,3
]}

Su, Hsin-Ning ^{[1
]}

机构：

[1] Sci & Technol Policy Res & Informat Ctr, Natl Appl Res Labs, Taipei 106, Taiwan

[2] Natl Chengchi Univ, Grad Inst Technol & Innovat Management, Taipei 116, Taiwan

[3] Univ Sussex, Freeman Ctr, SPRU Sci & Technol Policy Res, Brighton BN1 9QE, E Sussex, England

来源：

TECHNOLOGICAL FORECASTING AND SOCIAL CHANGE | 2011年 / 78卷 / 03期

关键词：

Bibliometric analysis; Patent analysis; Text-mining; Trend analysis; Etching; PATENT ANALYSIS; BIBLIOMETRIC ANALYSIS; TECHNOLOGY; INNOVATION;

D O I：

10.1016/j.techfore.2010.08.006

中图分类号：

F [经济];

学科分类号：

02 ;

摘要：

Understanding technology development trends is of critical importance to countries, industries and enterprises to be sustainable in global competition. Attempts have been made to establish trend analysis by bibliometric and patent analyses. Also text-mining uncovers hidden and important information from structured or unstructured documents which serve as knowledge carriers. This study aims to provide a systematic approach for integrated trend analysis that takes into account bibliometric analysis, patent analysis and text-mining analysis. Etching is selected as the case study for integrating trend analysis method proposed in this study. Also, validity and applicability of the integrated analysis are evaluated. (C) 2010 Elsevier Inc. All rights reserved.

引用

页码：386 / 407

页数：22

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